AVS 55th International Symposium
From Nano to Astronomical: The Science & Technology of Materials, Interfaces, & Processing

Registered AVS 55 attendees are invited to visit the exhibit which comprises an extensive display of tools, equipment, services and consulting for film deposition, surface and interface measurements and analysis, materials, chemicals, supplies, vacuum production and measurement, and related instrumentation for surface, interface and film measurements, as well as professional literature and publications in these topics. 

In addition, consultants, engineers, biologists, chemists, physicists, purchasing professionals, scientists, students, technicians, and exhibitor staff working or studying in the fields of applied surface science, biomaterial interfaces, electronic materials and processing, magnetic interfaces, manufacturing science, MEMS/NEMS, nanoscience, thin film, plasma science, surface science, or vacuum technology are welcome to register for FREE. To register, please complete the following registration form at http://www2.avs.org/symposium/AVS55/pages/registration.html. Note: a business card and/or student ID will be requested at the registration counter for identification.

If you are interested in: •fundamental materials science, •materials characterization, •interfacial phenomena, •materials applications in energy, surface engineering, micro/nano-electronics, •nano-science and technology, •materials processing and equipment, •MEMS/NEMS processing and applications,... you can find it, and much more, in this year’s technical program. Just take a look at the “Technical Program at a Glance” and you are bound to immediately find “must see” sessions every day of the week.

The Symposium Plenary Lecture, noon-1:00 PM on Monday, is one talk you do not want to miss. Prof. Jackie Ying, Executive Director of the A*STAR Institute of Bioengineering and Nanotechnology in Singapore, will discuss Nanostructure Processing of Advanced Catalysts and Biomaterials. Prof. Ying is Editor-in-Chief of Nano Today.

This year’s program consists of 111 oral and 2 poster sessions sponsored by the AVS Divisions and Technical Groups as well as 4 Topical Conferences, and 4 Focus Topics. Focus Topics are topics that cross the boundaries of several Divisions and Technical Groups. This year’s Focus Topics are: Biological, Organic, and Soft Materials; Energy; Nanomanufacturing; and Tribology. Topical Conferences included are:BioMEMS; Graphene; In Situ Microscopy and Spectroscopy: Interfacial and Nanoscale Science; and Synchrotron-based Spectroscopy and Spectro-microscopy.

In addition to their more traditional sessions, several divisions have included special sessions in their program. On Sunday the Biomaterial Interface Division is presenting their plenary session on Bio-inspired Catalysis, Energy Production, and Transduction: Opportunities and Challenges. On Monday BID is presenting a session to honor Prof. Bengt Kasemo, Chalmers University, Sweden, for his work in establishing the AVS BID. Also on Monday, the Plasma Science and Technology Division is presenting a session of invited highlights on plasma-surface interactions to honor the career of Prof. Herbert Sawin, MIT. On Tuesday the Nano Science and Technology Division is presenting The Frontiers of Nanoscience, an all invited session of distinguished speakers. On Wednesday the Magnetic Interfaces Division is presenting New Directions in Spintronics. Nobel Laureate Albert Fert will present an invited talk in this session.

The 50th Industrial Physics Forum (IPF) will be collocated with our symposium and is open to all registered attendees. This year’s theme is “Frontiers in Imaging: from Cosmos to Nano: Astronomical Imaging, Materials Imaging, Bio-Imaging and Marine/Terrestrial Imaging.”

Don’t forget to visit our Exhibition. Admission is free to all. Our popular Exhibitors Workshops are being continued this year. Stop by during Technical Session breaks to learn about new equipment, instruments, applications, and more!

This year’s amazing technical program is the result of many hours of work performed by volunteers representing the AVS technical divisions and groups, topical conferences, and focus topics, with the expert guidance and support of the AVS staff. We thank each and every one of you who dedicated your time and efforts to this year’s program. We certainly could not have done it without you!

Program Chairs

AVS