Micro- and nanolithography techniques are a key factor in pushing the limits of science and technology. This is especially true in the semiconductor industry which has made remarkable progress over the last 20 years. With the technology focus moving to progressively smaller scale, numerous lithography methods of manufacturing complex micro- and nanostructures (such as photo, nanoimprint, e-beam, soft and focused ion beam) have been developed. However, most of these techniques have limitations in the form of material choices, speed, cost and/or pattern shape/size. Clearly a fast, low-cost and versatile method of producing high quality surface nanostructures is needed. Here, an approach that offers low-cost, fast manufacturing of complex patterns over large scale is presented. By utilizing existing and well known technology such as the optical disc drive and combining it with tools used in photolithography a novel manufacturing technique is made available. The method proposed can be used to directly scribe the desired pattern on the light sensitive material or create a master to be used for transferring a pattern to the appropriate material. In all cases the procedure is similar. First, the desired motif is drawn on a computer using any drawing program. Second, a label enabled media such as lightscribe or labelflash DVD is coated with the material to be inscribed (e.g. photoresist to create a master). The disc is then inserted in the appropriate labeling disc drive and the pre-drawn image is engraved in material/photoresist. If necessary the disc can be treated post-scribing to create the structures; e.g. develop the photoresist. Finally, the surface of the material is engraved with the predetermined pattern. The method described here represents an affordable, fast and versatile way of manufacturing complex micro- and nanostructures without some of the design, throughput and material limitations faced by costlier techniques, making state of the art research more affordable and accessible.