Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2014) | |
Thin Films | Wednesday Sessions |
Session TF-WeP |
Session: | Thin Films Poster Session |
Presenter: | Keisuke Shiba, Tokyo Denki University, Japan |
Authors: | K. Shiba, Tokyo Denki University, Japan Y. Ohgoe, Tokyo Denki University M. Hiratsuka, Nanotec Corporation K. Ozeki, Ibaraki University K. Hirakuri, Tokyo Denki University, Japan K. Sato, Tokyo Denki University, Japan |
Correspondent: | Click to Email |
Diamond like carbon (DLC) film has been widely used because of its good properties such as good biocompatibility, anti-corrosion, high hardness, and high wear resistance. Therefore, DLC film has been applied to practical uses in medical and industrial fields. However, lack of film adhesion onto metallic materials has limited DLC coating applications. In order to improve adhesion strength of DLC film onto a substrate, intermediate layer such as Si layer has been introduced between the DLC layer and the substrate.
In this study, DLC films were deposited on stainless steel substrate by using r.f. plasma chemical vapor deposition (r.f. plasma CVD) without intermediate layer. To improve adhesion of DLC film onto metallic materials, the cylindrical electrode around a sample was installed on the cathode side electrode (Fig. 1, 2). Cylindrical electrode was selected for the height of 5, 10, and 20 mm, respectively. DLC film was deposited under the following condition ( CH4 gas pressure: 10 Pa, r.f. electrical power: 200 W, film thickness: 200 nm).
The adhesion of the DLC films was measured by using a scratch test. The characteristics of the DLC films were investigated using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS).
In the scratch test, the critical load of the film with 10mm-cylinder height showed 8.5 N, as compared with the film without the cylinder (4.6 N) (Fig. 3). Additionally, the Raman spectrum of the film on the stainless steel substrate showed peaks at approximately 1550 cm-1 and 1350 cm-1, referred to the G-band and D-band, respectively.
These results showed that the films were a typical DLC film and the DLC film was completely deposited with strong adhesion between the films and substrates by using only r.f. plasma CVD technique. This technique affects to DLC film adhesion property onto metallic materials under r.f. plasma CVD process.