Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2014) | |
Thin Films | Tuesday Sessions |
Session TF-TuP |
Session: | Thin Films Poster Session |
Presenter: | Jihun Shin, Pusan National University, Republic of Korea |
Authors: | J.H. Shin, Pusan National University, Republic of Korea S.J. Kim, Pusan National University, Republic of Korea S.S. Ha, Pusan National University, Republic of Korea Y.J. Im, Pusan National University, Republic of Korea C.H. Park, Pusan National University, Republic of Korea M.S. Yi, Pusan National University, Republic of Korea |
Correspondent: | Click to Email |
We investigated the effect of double active layer and acetic acid stabilizer for zinc tin oxide thin film transistor (TFTs) fabricated using solution processes.
Double active layer was composed of two layers made by ZTO solution doped with different Sn concentration (Sn 30 atomic % or Sn 60 atomic %). ZTO solutions were synthesized by dissolving zinc acetate dehydrate and tin chloride dehydrate which were dissolved in 2 different stabilizer solutions. AA solution was prepared with 2-methoxyethanol added with acetic acid, where ME solution was prepared with 2-methoxyethanol added with mono-ethanolamine. Thus the AA-ZTO films and ME-ZTO films represent ZTO active layer films formed from AA solution and ME solution, respectively.
The bottom-gate TFTs were fabricated on highly doped n-type silicon wafer which is covered with 200nm SiO2 layer as a gate insulator. Bottom active layer of ZTO film was deposited on the gate oxide layer by spin-coating the solution at room temperature, drying at 300 °C for 10 min, and the top active layer of ZTO film was made on the bottom ZTO film by same method and then annealing at 500 °C for 60 min. Fig. 1 shows the schematics of the double active layer ZTO TFT.
By adding acetic acid into the stabilizer solution instead of commonly used mono-ethanolamine, electrical performance of ZTO TFTs is enhanced. The XPS and TG-DTA(thermogravimetry differential thermal analysis) data shown in Fig. 2 and 3, have demonstrated that acetic acid plays a role in lowering decomposition temperature and reducing hydroxyl groups in the film.
By using double active layer (bottom layer: Sn 60 at. %, top layer: Sn 30 at. %) in ZTO TFTs, the electrical performance is enhanced. We demonstrated that the bottom active layer supplied electron carriers easily from high Sn concentration, and the top ZTO layer suppressed the leakage current of TFTs because it has relatively lower carrier concentration than the bottom ZTO layer.
The best performances were obtained at Sn concentration of 60 at. % in bottom ZTO layer and 30 at.% in top ZTO layer with the added acetic acid as a stabilizer, where the ZTO TFT exhibited an on/off ratio of 1.1×109, a saturation mobility of 5.04 cm2/V·s, a subthreshold slope of 0.11 V/decade, and a threshold voltage of 1.6 V. Fig. 4 depicts the transfer curves of the TFTs and the summarized electrical parameters of the ZTO TFTs were shown in Table 1.