Winners of the John A. Thornton Memorial Award
The John A. Thornton Memorial
Award and Lecture was established in 1988 as a memorial to Dr. John A. Thornton
to recognize outstanding research or technological innovation in the areas of
interest to the AVS with emphasis on the fields of thin films, plasma
processing, and related topics. Until 1995, the Award was conferred annually or
biennially as a suitable candidate was identified; since then, it may be
conferred biennially. It consists of a cash award, currently $10,000, a
commemorative plaque stating the nature of the award, and an honorary
lectureship at a regular session of the International Symposium.
1989
E. Kay
“For pioneering contributions to the study of film
growth phenomena in sputtering and plasma polymerization, including study of
microstructure relationship to film properties.”
1990 Maurice H. Francombe
“For contributions to thin film processes and materials for solid state
components.”
1991 Joseph E. Greene
“For outstanding research in the area of thin-film science with emphasis on
the effects of ion bombardment on the growth and properties of semiconductor
materials.”
1992 Thomas R. Anthony
“For pioneering contributions to the fundamental understanding, development,
and effective applications of CVD diamond technology.”
1993 John W. Coburn and Harold F. Winters
“For seminal work in the mechanistic aspects of materials processing with
glow discharges and ion beams.”
1994 D.A. Hoffman
“For basic contributions to the effects of magnetron sputtering on the
stress and microstructure of thin films, gas dynamics and resputtering.”
“For his seminal contributions to the science and applications of hard coatings, particularly transition-metal nitrides”
"For his pioneering research on ion beam deposition and sputtered thin films"
"For his innovative and outstanding research, teaching, and technical leadership in the organization and application of thin films as transparent conducting oxides and solar cells"
“For his seminal contributions to the atomic-level understanding of surface and thin film magnetism”
2003 William D. Sproul
“For seminal contribution to the science and technology of sputtering.”