Course | Year Offered | |||||||||||||||||
84 | 85 | 86 | 87 | 88 | 89 | 90 | 91 | 92 | 93 | 94 | 95 | 96 | 97 | 98 | 99 | 00 | 01 | |
An Introduction to Ellipsometry | X | |||||||||||||||||
An Overview of Thin Film Deposition & Etching Processes | X | X | X | X | ||||||||||||||
Application of Residual Gas Analysis in Semiconductor Processes | X | |||||||||||||||||
Basic Microelectronic Processing | X | X | ||||||||||||||||
Basic Vacuum Technology | X | X | X | X | X | X | X | X | X | X | X | X | X | |||||
Clean Room Technology | X | |||||||||||||||||
CMP for Microelectronics Manufacturing | X | X | X | |||||||||||||||
CVD For Microelectronics | X | X | X | X | X | |||||||||||||
Depth Profiling | X | |||||||||||||||||
Dielectrics for Microelectronics | X | X | X | |||||||||||||||
Full Wafer Particle and Defect Detection, Review, Characterization | X | X | ||||||||||||||||
Fundamentals and Process Characterization of Ion Implantation | X | |||||||||||||||||
High Density Plasma Processing of Microelectronic Materials | X | X | ||||||||||||||||
Mass Flow Controllers-Fundamentals, Techniques and Applications | X | X | X | |||||||||||||||
Nucleation, Growth and Microstructure Evolution | X | X | ||||||||||||||||
Operation & Maintenance of Vacuum Pumping Systems | X | |||||||||||||||||
Optical Diagnostic Techniques for Plasma Processing | X | |||||||||||||||||
Partial Pressure Analyzers, Analysis and Applications | X | |||||||||||||||||
Plasma Enhanced CVD: Fundamentals, Techniques and Applications | X | X | X | |||||||||||||||
Plasma Etching and RIE | X | X | X | X | X | X | X | X | ||||||||||
Practical Process Design for Microlithography | X | |||||||||||||||||
Pumping Hazardous Gases | X | X | X | X | ||||||||||||||
Rapid Thermal Processing: Equipment Technology and Process | X | X | ||||||||||||||||
Reactive Sputtering and Deposition | X | |||||||||||||||||
Semiconductor Contacts-Their Science, Fabrication & Characterization | X | |||||||||||||||||
Sputter Deposition | X | X | X | X | X | X | ||||||||||||
Surface Analysis: The Major Methods | X | |||||||||||||||||
Surface Analysis: The Major Methods | X | |||||||||||||||||
Surface Preparation for Thin Film Deposition | X | X | ||||||||||||||||
Understanding and Modeling Contamination in Vacuum | X | |||||||||||||||||
Vacuum Leak Detection | X |