Symposium Chairs

Arutiun P. Ehiasarian, Sheffield Hallam University, UK,  a.ehiasarian@shu.ac.uk
Sanjay V. Khare, University of Toledo,USA,  khare@physics.utoledo.edu 

This symposium will provide a forum for presenting and discussing the latest advances in emerging non-conventional thin film technologies with an emphasis on new types of materials, processes, and applications that cut across topics of other symposia in the conference. Contributions are sought in the general areas listed below.

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F1.  Nanomaterials, Nanofabrication, and Diagnostics

Session Chairs: 

Suneel Kodambaka, UCLA - kodambaka@ucla.edu
Yolanda Aranda Gonzalvo, Hiden Analytical, UK -  gonzalvo@hiden.co.uk 

This session should cover work that focuses on harnessing nano-scale phenomena and inventive deposition strategies for new types of nanostructures and nano-material coatings with enhanced properties and/or multiple functionalities. Advances in graphene, nanotube, and nanowire growth and applications will be addressed, in addition to the uses and development of novel in-situ diagnostics to understand and control their growth process. Devising strategies that integrate nanostructures (e.g. graphenes, nanoparticles, nanotubes and nanowires) and their assemblies, using both traditional and newly evolving variants of vapor-phase, liquid-state and solid-phase deposition techniques, is a major challenge. Similarly, producing coatings of composite materials may require the use of a combination of deposition techniques either in series or in parallel. Diagnostics based in plasma composition and in surface Characterization are essential to understand the physical proprieties of the coatings and mechanisms of the plasma processes and plasma-surface interaction.  Parameters obtained from the plasma Characterization and plasma-surface interaction are used to discuss and analyse plasma processes for nanomaterials deposition. This session will be a forum for addressing such topics in the context of producing novel and advanced nano-structured materials, applying them towards new-generation nano-devices, and developing innovative manufacturing processes. 

Topics of interest include but are not limited to:

• Nanotube and/or nanowire coatings for optical and electrical applications

• Growth and deposition techniques for making graphene and other nanostructured layers

• Nanostructure synthesis and incorporation into coatings as fillers by in-situ and ex-situ processing

• Newly emerging direct-write, cluster-beam, and bio-inspired deposition methods

• Processing-structure-stability-property relationships

• Novel application concepts or prototypes using nano-engineered structures

• Plasma fundamentals and diagnostics

Invited Speaker:  

Daniel Gall, Rensselaer Polytechnic Institute, USA,  galld@rpi.edu – Title TBA

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F2.  High Power Impulse Magnetron Sputtering

Session Chairs: 

Ralf Bandorf, Frauhnhofer IST, Germany – ralf.bandorf@ist.fraunhofer.de

Jolanta Sapieha, Ecole Polytechnique de Montreal, Canada – jolanta-ewa.sapieha@polymtl.ca

High power impulse magnetron sputtering (HIPIMS) opens up new possibilities as a highly ionized PVD technology that is actually establishing itself in many industrial applications, new approaches for tailored film properties. The major benefit of the HIPIMS technology is the compatibility with existing PVD machines offering superior coatings. The published results range from hard coatings, to optical coatings, and recently also photovoltaics. In general different approaches for the creation of highly ionised plasmas are used in HIPIMS. A proposed classification is by the pulse length ranging from short pulse of 1 to 20 µs over the most studied regime of 50 to 200 µs to large and extra large pulses from 500 µs and more. Understanding of the relationship between the different pulses and pulse sequences and process, microstructure, and resulting film properties is gaining depth and diversifying the application of the new technology. The availability of new and improved electronic hardware also boosts the possibility for the efficient generation of highly ionised plasmas. Also better fundamental understanding and first approaches for theoretical models build a basis for the effective and successful improvement and industrialisation of HIPIMS. 

The session solicits presentations from academia and industry that cover both the basic understanding as well as new applications. We seek to provide a forum to discuss all aspects of HIPIMS technology from the plasma generation to the final application. In particular we encourage potential authors to submit papers dealing with the plasma generation, plasma and discharge physics, simulation and modelling, reactive processes and process control, substrate pre-treatment and adhesion improvement, mechanisms of film growth, industrial applications, production, up scaling and equipment. 

Invited Speaker: 

Frank Papa, Hauzer Techno Coating BV, The Netherlands, FPapa@hauzer.nl – Title TBA

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F3. New boron, boride and boron nitride based coatings

Session Chairs: 

Hans Hoegberg hanho@ifm.liu.se , Linköping University
Martin Keunecke Martin.keunecke@ist.fraunhofer.de , FhG IST 

Boron nitride and other boron containing thin film materials such as the borides have attracted considerable attention over the last decade, especially because of their remarkable physical, chemical, biological and tribological properties.  This session will focus on the relationship between deposition conditions, microstructure, chemistry and properties and behavior of this class of materials. Contributions that give new insight into the growth kinetics, structure control, nanostructures fabrication, and new and innovative methods of characterization, as well as papers dealing with the applications of these materials, are encouraged. 

Invited Speaker:  

John R. Abelson, University of Illinois at Urbana- Champaign, USA

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F4/C2: Thin Films for Photovoltaics and Supercapacitors: Synthesis and Characterization  

Session Chairs: 

Toshihiro Miyata, Kanazawa Inst. Tech., Japan, tmiyata@neptune.kanazawa-it.ac.jp
Nicolas Drolet, Konarka, USA, NDrolet@konarka.com

This session will address the optical, mechanical and electrical properties of thin film materials, coating methods, post deposition processing, and property-composition relationships for photo- and electrochromic coatings, multilayer electro-optic coatings, photo- and electro-luminescent inorganic and organic materials. Contributions demonstrating the application of these materials in emerging technologies that include micro-optical, thin-film transistors (TFTs), display and photovoltaic devices, and systems with enhanced performance at long wavelengths are of key interest. The session also will include contributions in Transparent Conducting Oxides (TCO) materials and control of their conduction type, n- and p-type, applications of semiconducting and TCO films, TCO films as transparent electrode for E-paper/flexible displays and optoelectronic devices. Coatings for flexible and transparent devices and blocking electromagnetic interference for Information & Telecommunications are welcome topics.

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F5. New Oxynitride Coatings 

Session Chairs: 

Wolfgang Kalss, Oerlikon Balzers, wolfgang.kalss@oerlikon.com
Sven Ulrich, Karlsruhe Institute Technology. Sven.Ulrich@imf.fzk.de 

Both nitride and oxide based hard coatings were in the focus of intense research for the last several decades. Multifunctional stable and metastable oxynitride coatings are expected to be an excellent bridge between both materials groups, and therefore  are of extraordinarily large interest in science, in research and development as well as for industrial applications, especially cutting, due to their outstanding properties like high oxidation resistance, excellent chemical inertness, very good mechanical properties at elevated temperatures and particularly high temperature low friction behaviors. This session is focused on the development and understanding of the material itself and therefore on relationships and knowledge-based correlations between process parameters, micro structures and properties as well as on modeling. Applications of this new class of coatings are also considered.  

Invited Speakers: 

Jacob Sjölén, Seco Tools AB, Sweden, jacob.sjolen@secotools.com “Oxynitride Coatings - Opportunities and Obstacles from an Industrial Perspective” 

Yusuke Tanaka, Mitsubishi Materials Corporation, Japan, yustanak@mmc.co.jp, “Structure, Properties and Cutting Performance of Oxynitride Coatings and / or Partially Oxidized Nitride Coatings” 

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F6. Coatings for Compliant Substrates  

Session Chairs: 

Ben Beake, Micromaterials Co., UK, ben@micromaterials.co.uk
Roberto M. Souza, Polytechnic School of the University of Sao Paulo Sao Paulo, Brazil, roberto.souza@poli.usp.br 

In modern components and active devices there is an increasing need to deposit metal and ceramic coatings onto more compliant substrates such as polymers or light metals for reasons of design flexibility or weight reduction. In such cases the properties of the coating/substrate system and the mechanisms of failure can be considerably different for similar coatings on harder, stiffer substrates. This session solicits papers on low temperature coating processes for compliant substrates such as atomic layer deposition, microstructures and properties of coatings on polymers, aluminum, magnesium, and lithium alloys, mechanical analysis and design rules and the assessment of failure mechanisms for coatings on compliant substrates. Applications papers are particularly welcome in the areas of organic electronics, packaging and weight reduction in transportation. 

Invited Speaker:

Peter Kelly, Manchester Metropolitan University, UK – Title TBA

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Technical Symposia:

A. Coatings for Use at High Temperature

B. Hard Coatings and Vapor Deposition Technology

C.Fundamentals and Technology of Multifunctional Thin Films

D. Biomedical Coatings

E. Tribology and Mechanical Behavior of Coatings and Thin Films

F. New Horizons in Coatings and Thin Films

G. Applications, Manufacturing, and Equipment

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Tutorial Sessions:

TS1. Computational & Experimental Studies of Thin Film Growth: An Atomistic View

TS2. Coatings for Fuel Cells & Batteries

TS3. Surface Engineering for Thermal Transport, Storage and Harvesting

TS4. Characterization: Linking Synthesis, Properties and Microstructure

TS5. Energetic Materials and Micro-Structures for Nanomanufacturing