Symposium Chairs

Marco Cremona, Pontificia Universidade Catolica do Rio de Janeiro, Brazil, cremona@fis.puc-rio.br
Tetsuya Yamamoto, Kochi University of Technology, Japan, yamamoto.tetsuya@kochi-tech.ac.jp           

This Symposium encompasses all aspects of optical thin films and related technologies.  Papers are solicited for, but not limited to, the general subjects listed below.  Topics of primary interest include recent advances in the processes and technologies for the deposition of optical films, materials for optical thin film devices ranging from optical filters and optical sensors to MOEMS, photonic crystals and "active" systems based on "smart" optical materials. This Symposium highlights the development of optical films for emerging applications; displays, energy control, security devices and multifunctional protective coatings.  We particularly welcome studies that address the relationships between process, microstructure, composition, and the resulting film properties. Papers describing new and improved process control and in situ real time monitoring, film growth mechanisms and novel characterization techniques for thin film optical materials are also sought.

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C1.  Recent Advances In Optical Thin Films 

Session Chairs:

Kumar Khajurivala, Janos Technology, Inc. Kumar@Janostech.com
Rob Sczupak, Reynard Corporation, RSczupak@reynardcorp.com  

Optical coating technologies continue to advance, driven on one hand by new developments in thin film monitoring techniques and deposition processes and, on the other hand, by a host of new advanced technology applications in areas ranging from medicine, optical communications, short-pulse high energy lasers, and space and astronomical components to displays, architectural and automobile windows, solar energy, and ophthalmic lenses.  New materials and synthesis methods have been key to advances in photovoltaics, photonic crystals, transparent conductors, high laser-induced damage threshold coatings and graded-index filters.  In addition to optical response requirements, many applications require properties such as low coating stress for reduced optical wave front distortion; chemical, environmental, and abrasion resistance; electromagnetic shielding; stability to wide temperature variation; biological protection; or compatibility with plastic or flexible substrates. This session will feature reports of state-of-the-art progress in optical thin film materials and coatings for advanced functionalities as well as applications in modern technologies.

Invited Speaker:

Manish  Chhowalla, Nano-materials and Devices Group, Rutgers University (manish1@rci.rutgers.edu),  ”Opto-Electronic Properties of Graphene Oxide Thin Films”.

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C2/F4  Thin Films For Photovoltaics and Active Devices: Synthesis and Characterization

Session Chairs: 

Toshihiro Miyata, Kanazawa Inst. Tech., Japan, tmiyata@neptune.kanazawa-it.ac.jp

Nicolas Drolet, Konarka, NDrolet@konarka.com (to be confirmed) 

This session will address the optical, mechanical and electrical properties of thin film materials, coating methods, post deposition processing, and property-composition relationships for photo- and electrochromic coatings, multilayer electro-optic coatings, photo- and electro-luminescent inorganic and organic materials. Contributions demonstrating the application of these materials in emerging technologies that include micro-optical, thin-film transistors (TFTs), display and photovoltaic devices, and systems with enhanced performance at long wavelengths are of key interest. The session also will include contributions in Transparent Conducting Oxides (TCO) materials and control of their conduction type, n- and p-type, applications of semiconducting and TCO films, TCO films as transparent electrode for E-paper/flexible displays and optoelectronic devices. Coatings for flexible and transparent devices and blocking electromagnetic interference for Information & Telecommunications are also welcome topics.

Invited Speakers:

Richard van de Sanden, Eindhoven University of Technology, Netherlands (M.C.M.v.d.Sanden@tue.nl),"Plasma Processing for Photovoltaics: Fundamentals and Applications" 

Antonio Facchetti, Northwestern University,  (a-facchetti@northwestern.edu) “Polymeric Materials and Self-Assembled Interlayers for Printed Photovoltaic Cells”

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C3. Optical Characterization Of Thin Films, Surfaces and Devices 

Session Chairs:

Uwe Beck, BAM Berlin, Germany, uwe.beck@bam.de
Eva Schubert, University of Nebraska-Lincoln, USA, evaschub@engr.unl.edu 

Optical ex-situ and in-situ characterization techniques for thin films, surfaces, and devices play an important part in material science and engineering, because these techniques operate at high speed and typically require no extra sample preparation. Because of their non-destructive and non-contact mode of operation, they are applicable both in air, vacuum, and plasma. Consequently, optical methods play a unique and important role in research, development, and process control for engineered surfaces. They are increasingly used for coatings which are not only intended for optics but can be nevertheless studied and controlled by optical techniques covering a wide spectral range from EUV, UV-VIS-IR to THz. Papers are solicited on recent advances in optical characterization of thin films and engineered surfaces including new methods of measurement, data analysis, and applications of established techniques to new material systems such as meta-, nano-, and biomaterials as well as photovoltaics. Techniques of interest include but are not limited to spectrophotometry, ellipsometry, scatterometry, interferometry, Raman spectroscopy, advanced microscopy (e.g. near-field optical), X-ray methods (XRR, GIXD), and laser-material interaction.  Papers on the characterization of devices such as micro-lenses, laser-mirrors, interference filters, low-E glazings, solar cells and others can also be submitted. 

Invited Speakers:

Matthias Böse, Bruker Optik GmbH, Germany (matthias.boese@bruker.de) "Analysis of Thin Films and Surfaces by FTIR and Raman Microscopic Imaging”.

Stephan Braun,  Fraunhofer-Institute for Werkstoff-and Strahltechnik (IWS), Germany (stefan.braun@iws.fraunhofer.de), "Characterization of Nanometer Films by X-Ray and EUV Reflectometry".

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Technical Symposia:

A. Coatings for Use at High Temperature

B. Hard Coatings and Vapor Deposition Technology

C.Fundamentals and Technology of Multifunctional Thin Films

D. Biomedical Coatings

E. Tribology and Mechanical Behavior of Coatings and Thin Films

F. New Horizons in Coatings and Thin Films

G. Applications, Manufacturing, and Equipment

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Tutorial Sessions:

TS1. Computational & Experimental Studies of Thin Film Growth: An Atomistic View

TS2. Coatings for Fuel Cells & Batteries

TS3. Surface Engineering for Thermal Transport, Storage and Harvesting

TS4. Characterization: Linking Synthesis, Properties and Microstructure

TS5. Energetic Materials and Micro-Structures for Nanomanufacturing