Symposium Chairs

Marco Cremona, Pontificia Universidade Catolica do Rio de Janeiro, Brazil, cremona@fis.puc-rio.br
Tetsuya Yamamoto, Kochi University of Technology, Japan, yamamoto.tetsuya@kochi-tech.ac.jp 

This Symposium encompasses all aspects of optical thin films and related technologies. Papers are solicited for, but not limited to, the general subjects listed below. Topics of primary interest include recent advances in the processes and technologies for the deposition of optical films, materials for optical thin film devices ranging from optical filters and optical sensors to MOEMS, photonic crystals and "active" systems based on "smart" optical materials. This Symposium highlights the development of optical films for emerging applications; displays, energy control, security devices and multifunctional protective coatings. We particularly welcome studies that address the relationships between process, microstructure, composition, and the resulting film properties. Papers describing new and improved process control and in situ real time monitoring, film growth mechanisms and novel characterization techniques for thin film optical materials are also sought.

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C1.  Recent Advances In Optical Thin Films 

Session Chairs

Kumar Khajurivala, Janos Technology, Inc., USA, Kumar@Janostech.com
Rob Sczupak, Reynard Corporation, USA, RSczupak@reynardcorp.com 

Optical coating technologies continue to advance, driven on one hand by new developments in thin film monitoring techniques and deposition processes and, on the other hand, by a host of new advanced technology applications in areas ranging from medicine, optical communications, short-pulse high energy lasers, and space and astronomical components to displays, architectural and automobile windows, solar energy, and ophthalmic lenses. New materials and synthesis methods have been key to advances in photovoltaics, photonic crystals, transparent conductors, high laser-induced damage threshold coatings and graded-index filters. In addition to optical response requirements, many applications require properties such as low coating stress for reduced optical wave front distortion; chemical, environmental, and abrasion resistance; electromagnetic shielding; stability to wide temperature variation; biological protection; or compatibility with plastic or flexible substrates. This session will feature reports of state-of-the-art progress in optical thin film materials and coatings for advanced functionalities as well as applications in modern technologies.

Invited Speaker

Susumu Noda, Kyoto University, JP, "Trapping and Emission of Photons by a Single Defect in a Photonic Bandgap Structure"

Xiao Wei Sun, Nanyang Technological University, JP, “ZnO as a Light Emitter: Application of ZnO in LEDs”

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C2/F4  Thin Films For Photovoltaics and Active Devices: Synthesis and Characterization

Session Chairs

Tomoaki Terasako, Ehime University, Japan, terasako.tomoaki.mz@ehime-u.ac.jp
Richard van de Sanden, Technische Universiteit Eindhoven, Netherlands, m.c.m.v.d.sanden@tue.nl 

This session will address the optical, mechanical and electrical properties of thin film materials, coating methods, post deposition processing, and property-composition relationships for photo- and electrochromic coatings, multilayer electro-optic coatings, photo- and electro-luminescent inorganic and organic materials. Contributions demonstrating the application of these materials in emerging technologies that include micro-optical, thin-film transistors (TFTs), display and photovoltaic devices, and systems with enhanced performance at long wavelengths are of key interest. The session also will include contributions to fabrications, conduction-type (n- and p-types) controls and applications of semiconducting and Transparent Conducting Oxides (TCO) films. Coatings for flexible and transparent devices, such as transparent electrode for E-paper/flexible displays, and blocking electromagnetic interference for Information & Telecommunications are also welcome topics.

Invited Speakers

Shigeru Niki, National Institute of Advanced Industrial Science & Technology (AIST), JP, “High-Efficiency Cigs Solar Cells and Submodules by Multi-Stage Evaporation”

Mariadriana Creatore, Eindhoven University of Technology, NL, “Natively Textured ZnO for CIGS Solar Cells”

Andy P. Monkman, Durham University, UK, “Organic Thin Films Spectroscopy”

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C3. Optical Characterization Of Thin Films, Surfaces and Devices 

Session Chairs

Joerg Krueger, BAM Berlin, Germany, joerg.krueger@bam.de
Eva Schubert, University of Nebraska-Lincoln, USA, evaschub@engr.unl.edu 

Optical ex-situ and in-situ characterization techniques for thin films, surfaces, and devices play an important part in material science and engineering, because these techniques operate at high speed and typically require no extra sample preparation. Because of their non-destructive and non-contact mode of operation, they are applicable both in air, vacuum, and plasma. Consequently, optical methods play a unique and important role in research, development, and process control for engineered surfaces. They are increasingly used for coatings which are not only intended for optics but can be nevertheless studied and controlled by optical techniques covering a wide spectral range from EUV, UV-VIS-IR to THz. Papers are solicited on recent advances in optical characterization of thin films and engineered surfaces including new methods of measurement, data analysis, and applications of established techniques to new material systems such as meta-, nano-, and biomaterials as well as photovoltaics. Techniques of interest include but are not limited to spectrophotometry, ellipsometry, scatterometry, interferometry, Raman spectroscopy, advanced microscopy (e.g. near-field optical), X-ray methods (XRR, GIXD), and laser-material interaction. Papers on the characterization of devices such as micro-lenses, laser-mirrors, interference filters, low-E glazings, solar cells and others can also be submitted.

Invited Speakers

Tino Hofmann, University of Nebraska, USA, “Terahertz Ellipsometry in Material Characterization”

Christian Spielmann, University of Jena, DE, “Studying Matter with Laser Driven X-Ray Sources”

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C4. Transparent Conductive Films: Inorganic Oxides, Organic Materials, Metals 

Session Chairs

Peter Kelly, Manchester Metropolitan University, United Kingdom, peter.kelly@mmu.ac.uk
Sunnie Lim, Lawrence Berkeley National Laboratory, USA, sunnielim@lbl.gov 

Transparent conductive films, fabricated from either inorganic or organic materials, have semiconducting properties with a large bandgap, providing spectrally selective characteristics. They are an integral component in many optoelectronic devices, acting as both a window layer and an electrically conducting contact layer. The performance of these layers is intrinsically linked to their composition, structures and properties, which are in turn determined by the chosen deposition technique and processing parameters. New developments in this area are constantly seeking to improve performance and reduce costs.

This session seeks contributions on topic into all areas of transparent conductive films including, but not limited to:

1. The understanding and characterization of optical, electrical and physical properties

2. Interrelationships between processing parameters and film properties.

3. New transparent materials and emerging techniques.

Invited Speakers

Bernd Szyszka, Fraunhofer Institute for Surface Engineering and Thin Films, DE, “The Material Challenges in Oxide Electronics: Recent Progress in Amorphous Indium Free TCOs for Oxide TFTs”

Klaus Ellmer, Helmholtz-Zentrum Berlin fuer Materialien und Energie GmbH, DE, “Charge Carrier Transport in Zinc Oxide and its Alloys: A Comparison”

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C5/F7. Polarisation Phenomena in Thin Films and Devices 

Symposiums Chairs

David Holec, Montanuniversitaet Leoben, Austria, david.holec@unileoben.ac.at
Shelly Moram, University of Cambridge, United Kingdom, mam65@cam.ac.uk 

In this session we aim to bring together thin film researchers working with materials showing polarisation phenomena (e.g. the piezoelectric effect) with the device design and fabrication community. We hope to bridge the gap between the field of thin film coatings and the fields of RF, optoelectronic and MEMS devices, which may be linked through the use of materials with multiple applications across more than one of these fields.

For thin film researchers, we invite contributions on the topics including, but not limited to, the measurement and prediction of basic material properties, thin film synthesis and characterisation, all with respect to polarisation phenomena.

For device researchers, we especially invite papers on the design and fabrication of piezoelectric, photonic and optoelectronic devices created using materials displaying polarisation phenomena.

For all contributors, contributions on topics that highlight the multifunctional properties of material systems, including polarisation phenomena, or that illustrate the links between different fields, are strongly encouraged for submission to this session.

Invited Speakers

Eoin O'Reilly, Tyndall National Institute, IE, “Control and Engineering of Spontaneous and Piezoelectric Polarisation in Nitride-based Nanostructures”

Ilia Katardjiev, Uppsala University, SE, “Recent Developments in the Thin Film Electro-Acoustic Technology”

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Technical Symposia:

A. Coatings for Use at High Temperature

B. Hard Coatings and Vapor Deposition Technology

C.Fundamentals and Technology of Multifunctional Thin Films

D. Coatings for Biomedical and Healthcare Applications

E. Tribology & Mechanical Behavior of Coatings and Engineered Surfaces

F. New Horizons in Coatings and Thin Films

G. Applications, Manufacturing, and Equipment

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Tutorial Sessions:

TS1. Surface Engineering for Thermal Transport, Storage and Harvesting

TS2. Advanced Characterization of Coatings and Thin Films

TS3. Energetic Materials and Micro-Structures for Nanomanufacturing

TS4. Graphene and 2D Nanostructres