Suneel Kodambaka, UCLA, USA, kodambaka@ucla.edu
Johanna Rosén, Linköping University, Sweden, johro@ifm.liu.se

The session provides a forum for new and existing techniques and research opportunities for atomic-scale understanding of the thin film growth and the structure-property relationships. The physical, chemical, and mechanical properties of thin films and coatings depend on their microstructure and surface morphology. Both these parameters are controlled by the interplay of thermodynamic and kinetic driving forces present during physical (or chemical) vapor deposition of thin films. This area of research is interdisciplinary and requires the development and application of several state-of-the-art theoretical, experimental, and/or computational tools to understand, at the atomic or molecular scale, 1) the underlying chemical reaction pathways and physical processes occurring on surfaces during deposition and 2) relation between the thin film structure and its property. This understanding is essential for the synthesis of technologically important, high-performance, coatings of advanced materials.  

Sessions will focus on, but not limited to, the atomic-scale understanding of:  

(1) Texture and surface morphological evolution,

(2) Effects of ion irradiation on thin film growth,

(3) Nucleation and growth of thin films

(4) Structure-property relationships.

Invited Speakers

Eric Chason, Brown University, Providence RI, USA, “Stress Evolution in Thin Films”

Cristian Ciobanu, Colorado School of Mines, USA – “DFT Studies of Graphene Thin Films”

Marcel Rost, Leiden University, Netherlands, “STM Studies of Thin Film Growth” 

Aram Amassian, Cornell University, USA “Tunable Molecular Beams: A New Frontier in Vacuum Deposition of Organic Semiconductors”

Symposium A | Symposium B | Symposium C | Symposium D | Symposium E | Symposium F | Symposium G | Symposium H
  Topical Session TS-1 | Topical Session TS-2 | Topical Session TS-3  | Topical Session TS-4 
Conference Highlights | Exhibit Information