Symposium Chairs 

Per Persson, IFM, Linköping University, Sweden, perpe@ifm.liu.se

Christina Scheu, University of Munich, Department of Chemistry and Biochemistry, Munich, Germany, Christina.Scheu@cup.uni-muenchen.de

This symposium focuses on the advanced characterization of coatings and thin films that enables an understanding of growth and surface modification processes as well as fundamental structure-property-processing relationships.  Contributions are of interest that either highlight the application of, or draw attention to, recent advances in analytical methods and characterization techniques including numerical evaluation and quantification procedures (e.g. factor analysis, depth profiling, etc.) to reveal the micro- and nano-structure, chemical composition, chemical states and phases of coatings, thin films, interfaces, and surfaces during or after surface modification. Phase characterization, surface topography probes, compositional analysis, high spatial imaging and analysis, and hardness measurements continue to be subjects of interest in this Symposium. An emphasis is the presentation and the advancement of both standard and advanced characterization techniques as well as the introduction of new methods. 

F1. Advances in Characterization of Coatings and Thin Films

Session Chairs: Peter Schaaf, University of Goettingen, Germany, peter.schaaf@tu-ilmenau.de and Mark Baker, University of Surrey, UK, M.Baker@surrey.ac.uk 

This session solicits papers covering advanced characterization of the micro- and nano-structure of coatings and thin films. The focus is on recent developments in new characterization methods and established techniques for microstructural characterization by spectroscopy and imaging, with emphasis on surfaces and interfaces. Methods include but are not limited to high resolution TEM, SEM, STM/AFM, EPMA, XRD, grazing X-ray reflectivity (GIXR), medium energy ion scattering (MEIS), AES, XPS, EELS, SIMS, TOFSIMS, RBS, atom probe measurements and other spatially resolved imaging and elemental mapping techniques.

Invited Speakers

Dr David Larson, Imago Instruments, Madison, Wisconsin (previously at Oak Rodge and Oxford University), “Atom Probe Microscopy Applied to Thin Films and Coatings”

 Dr. André Vantomme, Katholieke Universiteit Leuven, “Real-Time RBS and Other Advanced Methods for the Study of (Ternary) Silicide Formation”.
 

F2/B7.  In situ Characterization of Synthesis and Materials Properties

Session Chairs: Manfred Beckers, Thin Film Physics Division, IFM, Linköping University, Sweden manbe@ifm.liu.se and Diederik Depla, Ghent University, Belgium, diederik.depla@ugent.be 

In situ characterization of deposition processes, thin film growth and post-deposition treatment is a necessity for a better understanding of thin film properties and as an input for the modeling of the deposition process itself. Hence, this session solicits oral and poster presentations regarding the in situ characterization of deposition processes, thin film growth, as well as the properties of as deposited films. This comprises e.g. optical coatings, magnetic thin film multilayers, metallic thin films, and wear-resistant thin films just as well as e.g. microstructure and stress evolution, thermal stability, and other film properties. We specifically encourage the submission of contributions focusing on the modeling of the deposition process, especially those that link in situ characterization with modeling. 

Invited Speakers

Thomas Michely, University of Cologne “In situ STM Characterization” 

F3. Characterization by Electron and Ion Beam Microscopy

Session Chairs 

Masashi Watanabe, Lawrence Berkeley National Laboratory, USA, mwatanabe@lbl.gov
Jian-Guo Wen, University of Illinois, jgwen@uiuc.edu   

Transmission electron microscopy (TEM) is one of the most powerful techniques in combining structural and chemical characterization of thin films and coatings ranging from the micron to sub Ångström scale. We solicit both oral and poster presentations in the recent development and application of advanced TEM methods, including electron diffraction (ED), high resolution electron microscopy (HREM), aberration corrected microscopy, electron tomography, scanning transmission electron microscopy (STEM), electron energy-loss spectrometry (EELS) and energy-dispersive spectrometry (EDS). 

Invited Speakers

Susanne Stemmer, UC Santa Barbara, “Advanced Scanning Transmission Electron Microscopy of Oxide and Semiconductor Interfaces”

W. Kaplan, Technion, Israel,  “The Stability of Thin Metal Films in Contact with Oxides”.

Symposium A | Symposium B | Symposium C | Symposium D | Symposium E | Symposium F | Symposium G | Symposium H
  Topical Session TS-1 | Topical Session TS-2 | Topical Session TS-3  | Topical Session TS-4  
Conference Highlights | Exhibit Information