Symposium Chairs

David W. Reicher, S. Systems, Albuquerque, NM, david.reicher@kirtland.af.mil
Tetsuya Yamamoto, Kochi University of Technology, Japan, yamamoto.tetsuya@kochi-tech.ac.jp 

This Symposium encompasses all aspects of optical thin films and related technologies.  Papers are solicited for, but not limited to, the general subjects listed below.  Topics of primary interest include recent advances in the processes and technologies for the deposition of optical films, materials for optical thin film devices ranging from optical filters and optical sensors to MOEMS, photonic crystals and "active" systems based on "smart" optical materials. This Symposium highlights the development of optical films for emerging applications; displays, energy control, security devices and multifunctional protective coatings.  We particularly welcome studies that address the relationships between process, microstructure, composition, and the resulting film properties. Papers describing new and improved process control and in situ real time monitoring, film growth mechanisms and novel characterization techniques for thin film optical materials are also sought. 

 C1.  Recent Advances in Optical Thin Films 

Session Chairs 

            John Bellum, Sandia National Laboratories, USA jcbellu@sandia.gov
            Michael Trubetskov, Moscow State University, Russia, trub@srcc.msu.ru

Optical coating technologies continue to advance, driven on one hand by new developments in thin film monitoring techniques and deposition processes and, on the other hand, by a host of new advanced technology applications in areas ranging from medicine, optical communications, short-pulse high energy lasers, and space and astronomical components to displays,  architectural and automobile windows, solar energy, and ophthalmic lenses.  New materials and synthesis methods have been key to advances in photovoltaics, photonic crystals, transparent conductors, high laser-induced damage threshold coatings and graded-index filters.  In addition to optical response requirements, many applications require properties such as low coating stress for reduced optical wave front distortion; chemical, environmental, and abrasion resistance; electromagnetic shielding; stability to wide temperature variation; biological protection; or compatibility with plastic or flexible substrates. This session will feature reports of state-of-the-art progress in optical thin film materials and coatings for advanced functionalities as well as applications in modern technologies. 

Invited Speakers:

Douglas Smith, Plymouth Grating Laboratory, “Multi-Layer Dielectric Coatings and Processing for Production of Optical Gratings on Large Substrates” 

George Dobrowolski, NRC, Ottowa, Canada, “Unusual Optical Thin Film Solutions Based on Advances in Materials and Deposition Processes”

C2.  Optical Thin Films for Active Devices and Microsystems

Session Chairs

Marco Cremona, Pontifícia Universidade Católica, Brazil cremona@fis.puc-rio.br
Toshihiro Miyata, Kanazawa Inst. Tech., Japan, tmiyata@neptune.kanazawa-it.ac.jp

This session will address the optical, mechanical and electrical properties of thin film materials, coating methods, post deposition processing, and property-composition relationships for photo- and electrochromic coatings, multilayer electro-optic coatings, photo- and electro-luminescent inorganic and organic materials. Contributions demonstrating the application of these materials in emerging technologies that include micro-optical, thin-film transistors (TFTs), display and photovoltaic devices, and systems with enhanced performance at long wavelengths are of key interest. The session also will include contributions in Transparent Conducting Oxides (TCO) materials and control of their conduction type, n- and p-type, applications of semiconducting and TCO films, TCO films as transparent electrode for E-paper/flexible displays and optoelectronic devices. Coatings for flexible and transparent devices and blocking electromagnetic interference for Information & Telecommunications are welcome topics.  

Invited Speakers 

Markus Wohlgenannt, Phys. Dept. from Iowa University (USA), “Magnetoresistance in Organic Semiconductor Thin Film Devices”

Kentaro Utsumi, Tosoh Corporation, Japan, “New TCO: Attractive Potential Substitute for ITO in Flat Display Panel”

Gilles Dennier, Konarka, Austria, “Conjugated Polymer Based Organic Solar Cells: State of the Art and Future Challenges”

 C3. optical Characterization of Thin Films 

Session Chairs  

            Uwe Beck, BAM Berlin, Germany, uwe.beck@bam.de
           Tom Tiwald, J. A. Woollam Co, USA, ttiwald@jawoollam.com 

Optical characterization techniques for thin films, surfaces, and devices generally have the advantages of easy sample preparation and high speed measurement. Because the non-destructive and non-contact mode of operation, they are applicable both in air and vacuum. Consequently, optical methods play a unique and important role in research, development, and process control for engineered surfaces in the field of optics. They are increasingly used for coatings which are not intended for optics but can be nevertheless studied and controlled by optical techniques. It is requested to hand in papers on recent advances in optical characterization of thin films and engineered surfaces including new methods of measurement, data analysis, and applications of established techniques to new material systems such as meta-, nano-, and biomaterials as well as photovoltaics. Techniques of interest include but are not limited to spectrophotometry, ellipsometry, scatterometry, interferometry, Raman spectroscopy, advanced microscopy (e.g. near-field optical), X-ray methods (XRR, GIXD, XRD), and laser-material interaction.  Papers on the characterization of devices such as micro-lenses, laser-mirrors, interference filters, low-E glazings, and solar cells can also be submitted. 

Invited Speakers

Mathias Schubert, University of Nebraska-Lincoln, USA “Spectroscopic Ellipsometry  for Characterization of Thin Films and Surfaces” 

Detlev Ristau, Laserzentrum Hannover, Germany, “Laser Damage Thresholds of Optical Coatings”

Symposium A | Symposium B | Symposium C | Symposium D | Symposium E | Symposium F | Symposium G | Symposium H
   Topical Session TS-1 | Topical Session TS-2 | Topical Session TS-3  | Topical Session TS-4   
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