36th International Conference On
Metallurgical Coatings And Thin Films
ICMCTF 2009
 
April 27-May 1, 2009
Town and Country Hotel
San Diego, California, USA

 


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SYMPOSIUM B
Hard Coatings and Vapor Deposition Technology

 

Symposium Chairs 

Daniel Gall, Rensselaer Polytechnic Institute, USA, galld@rpi.edu
Guido Janssen
, Delft University of Technology, the Netherlands, g.c.a.m.janssen@tudelft.nl 

This Symposium will focus on surface engineering and materials science of hard films and coatings. Papers are solicited that address the fundamentals of deposition processes, properties of new single, multilayer, and nano-composite hard coatings, process-structure-property correlations, substrate-surface effects, modeling applications for hard coating technologies, and hard coating industrial practices.  Topics solicited include: fundamentals and developments of established 1) sputtering, vacuum arc, and CVD techniques; 2) plasma, ion-beam, and laser-assisted deposition and surface treatments; 3) hard nano-structured materials and hard surface characterization; as well as 4) new and emerging technologies for preparation and treatment of hard coatings and surfaces.  


B1. Sputtering Coatings and Technologies 

Session Chairs

Claus Rebholz, Cyprus University, Cyprus, claus@ucy.ac.cy 
Ming-Show Wong
, National Dong-Hwa University, Taiwan mswong@mail.ndhu.edu.tw

Papers concerning sputtering coatings and technologies are solicited. An emphasis will be on surface engineering by magnetron sputtering, and ion plating techniques. The session welcomes original papers both on the basics of reactive and non-reactive magnetron sputtering (in-situ measurements, process modeling, etc.), as well as on coating materials of topical interest, e.g. nano-structured and nano-composite thin films, oxide layers and solid lubricants.  

Invited Speakers:

Prof. Fu-Sheng Shieu, Department of Materials Engineering, National Chung Hsing University, Taiwan, “Development of Multi-Element and Multi-Functional Oxide Coatings” 

Prof. Jochen M. Schneider, RWTH Aachen, Germany, “Combinatorial Sputter Deposition for Thin Film Materials Design” 

Dr. Stijn Mahieu, Department for Solid State Sciences, Ghent University, Belgium; “Investigation of  the O- Ion Emission During Reactive Magnetron Sputtering"


 

B2. Arc and E-Beam Coatings and Technologies

Session Chairs

Vladimir Gorokhovsky, Arcomac Surface Engineering, LLC, USA,vgorokhovsky@arcomac.com
Joerg Vetter
, Sulzer Metaplas GmbH, Germany, Joerg.Vetter@sulzer.com 

Papers concerning cathodic arc and electron beam coatings and technologies are solicited. Emphasis is put on recent developments, including multi-element coatings, gradient and nanostructured coatings, hard and superhard coatings, energetic condensation process, and stress control.  Also of interest are contributions of high rate deposition using vapor deposition, ionized vapor deposition, and plasma immersion technique.  From a technology point of view, implementation of high-efficiency filters for industrial cathodic arcs is of a special importance. Applications include, but are not limited to, low friction coatings, high-temperature wear-resistant coatings, optical films, and biomaterials.   

Invited Speakers:

Prof. Ray Boxman, Tel Aviv University, Israel, “The Hot Refractory Anode Vacuum Arc: Mechanism and Deposition of Metallic and Compound Films”

Dr. O. Zimmer, Fraunhofer IWS, Germany, “Trends and Applications of Cathodic Arc Evaporation”  
    
 


B3. CVD Coatings and Technologies
 

Session Chairs 

Michel Pons, Grenoble Institute of Technology, France, michel.pons@simap.grenoble-inp.fr
Helga Holzschuh
, WALTER AG, Tübingen, Germany, helga.holzschuh@walger-ag.com

Papers are solicited on materials and/or techniques involving CVD processing for the growth of thin films and coatings. This session will address:

1) CVD techniques, such as for instance MTCVD, LPCVD, MOCVD, ALD, iCVD and HVPE, but also CVD techniques for low cost applications and novel CVD precursors.

(2) Properties of materials and structures grown by CVD

(3) Modeling techniques for the simulation of CVD processes and equipment from the molecular to the equipment scale.

(4) Novel processing tools and equipment. 

Invited Speakers 

Dr. Elisabeth Blanquet, Grenoble Institute of Technology, France, "Thin film growth by Atomic Layer Deposition (ALD)"

Dr. Akira Osada, Mitsubishi Materials Corporation, Japan, “Synthesis, Properties and Cutting Performance of the (Al,Cr)2O3 Layer by  CVD"                
 



B4. Laser and Ion Beam Surface Engineering
 

Session Chairs

Chris Muratore, UTC/Air Force Research Laboratory, USA, chris.muratore@wpafb.af.mil
Wolfgang Waldhouser
, Johanneum Research, Austria,wolfgang.waldhauser@johanneum.at

Papers are solicited on materials and/or techniques incorporating laser and ion beam‑based processing for protective, tribological, electronic or optical coating applications. Talks describing deposition processes (i.e., pulsed laser deposition, MAPLE, ion beam assisted deposition or any hybrid process incorporating a laser and/or ion beam) or other surface preparation and modification techniques (such as etching, patterning, implantation or hardening) are welcome.  

Invited Speakers:

Dr. Leonard J. Mahoney, Veeco Instruments Inc., USA, "Broad-area Ion Beam Systems for Materials Processing: An Overview of Technology and Applications"

Prof. Micrea Chipara, University of Texas Pan American, USA, "Ion Beam Irradiation Effects on Polymers"
 


B5. Properties and Characterization of Hard Coatings and Surfaces 


Session Chairs
 

Yip-Wah Chung, Northwestern University, USA ywchung@mccormick.northwestern.edu
Gregory Abadias,
Université de Poitiers, France, Gregory.Abadias@univ-poitiers.fr
Martin Fenker
, FEM Research Institute, Germany, fenker@fem-online.de  

Papers are encouraged that address the characterization of hard coatings and surfaces and the relationships between composition, microstructure, and properties as well as the effect of the relevant deposition parameters on the discussed properties. 

Invited Speakers:

David Duday, CRP - Gabriel Lippmann, Luxembourg, “High depth resolution SIMS, NanoSIMS and NanoAuger for Ultimate Characterization of Nanostructured Hard Coatings”

Filipe Vaz, Minho University, Portugal, “Influence of the Chemical Composition, Electronic Structure and Phase Evolution on the Electric and Optical Behavior of Zirconium Oxynitride Thin Films”

Ju-Liang (John) He, Feng Chia University, Taiwan, “Arc Ion Plated TiO2 - Microstructure, Properties and Applications”

Philippe Steyer, (INSA Lyon, France) “Contribution of an In Situ Approach by Environmental     Microscopy to Improve the Understanding of Oxidation Phenomena of Coated Steel”               
 


 B6.  Hard and Multifunctional Nano-Structured Coatings
 

Session Chairs

Michael Stüber, Forschungszentrum Karlsruhe, Germany, michael.stueber@imf.fzk.de
Christopher P. Mulligan
,
U.S. Army ARDEC, USA, c.mulligan@us.army.mil
Rosendo Sanjines
,
Ecole Polytechnique Fédérale de Lausanne EPFL, Switzerland, rosendo.sanjines@epfl.ch

Technological challenges in surface engineering demand new multifunctional thin film materials offering superior properties and performance. Such advanced coatings can be synthesized by designing their microstructure and architecture at the nano-scale including monolithic, multicomponent and layered structures. The use of materials selection concepts, nanoscale design strategies, and improved plasma deposition methods applying various energetic particles and activation processes enables the fabrication of thin film materials with simultaneously high hardness and toughness, controlled friction, and increased thermal or chemical stability. Consequently, new coatings with performance superior to state-of-the-art coatings can be developed. The emphasis of this session is on advanced nanostructured and nanocomposite coatings e.g., coatings exhibiting hard, superhard, tough, and multifunctional properties. Submissions are solicited on the synthesis, characterization, fundamental understanding, modelling and novel design strategies for nanostructured coatings with improved properties, and their industrial applications. 

Invited Speakers: 

Prof. Paul Mayrhofer, Department Physical Metallurgy and Materials Testing, Montanuniversität Leoben, Austria, “Processes, Properties and Application Potential of Ti-Al-X-N Thin Films”

Prof. Samir Aouadi, Department of Physics, Southern Illinois University, USA, “Progress in the Development of Adaptive Nitride-Based Coatings for High Temperature Tribological Applications”

Prof. Ludvik Martinu, Ecole Polytechnique de Montreal, Canada, “From Understanding the Growth Mechanism to the Design and Fabrication of High-Performance Functional Coating Architecture”

Dr. Juan Carlos Sanchez-Lopez, CSIC Universidad de Sevilla, Spain, “Metallic Carbide/Amorphous Carbon-Based Nanocomposite Coatings for Tribological Applications”

Prof. John Moore, Colorado School of Mines, USA, “The Effect of Magnetron Pulsing on the Structure and Properties of Nanostructured Multifunctional Tribological Coatings”

Prof. James Krzanowski, University of New Hampshire, USA, “Fabrication and Tribologica Properties of Composite Coatings Produced by Lithographic and Microbeading methods” 
 


B7/F2.  In situ characterization for deposition process and film properties modeling

Session Chairs 

                Diederik Depla, Ghent University, Belgium,
                Manfred Beckers
, Linköping University, Sweden,  

In situ characterization of deposition processes, thin film growth and post-deposition treatment is a necessity for a better understanding of thin film properties and as an input for the modeling of the deposition process itself. Hence, this session solicits oral and poster presentations regarding the in situ characterization of deposition processes, thin film growth, as well as the properties of as deposited films. This comprises e.g. optical coatings, magnetic thin film multilayers, metallic thin films, and wear-resistant thin films just as well as e.g. microstructure and stress evolution, thermal stability, and other film properties. We specifically encourage the submission of contributions focusing on the modeling of the deposition process, especially those that link in situ characterization with modeling.
 

Invited Speakers 

Prof. Dr. Thomas Michely, Universität zu Köln, Germany, "Fundamental aspects of Polycrystalline Thin Film Growth as seen by Scanning Probe Microscopy"           

 

 

Symposium A | Symposium B | Symposium C | Symposium D | Symposium E | Symposium F | Symposium G | Symposium H
   
Topical Session TS-1 | Topical Session TS-2 | Topical Session TS-3  | Topical Session TS-4 
Conference Highlights
| Exhibit Information