A. Coatings for Use at High Temperature 

Daniel Monceau, CIRIMAT ENSIACET, France

Brian Hazel, General Electric Aviation, USA

Bruce Rodman, NAVSEA, Philadelphia, USA

Dmytro Naumenko, FZ Jülich, Germany

Yong-ho Sohn, University of Central Florida, USA

Robert Vassen, Forschungszentrum Jülich, Germany

John Hutchinson, Harvard University, USA

Papken Hovsepian, Sheffield Hallam University, UK

B. Hard Coatings and Vapor Deposition Technology

Fu-Sheng Shieu, Natl. Chung  Hsing Univ., Taiwan

J. M. Schneider, RWTH Aachen University, Germany

Stijn Mahieu, Ghent University, Belgium

Ray Boxman, Tel Aviv University, Israel

Otmar Zimmer, Fraunhofer IWS, Germany

E. Blanquet, Grenoble Institute of Technology, France

Akira Osada, Mitsubishi Mater. Corporation, Japan

Leonard J. Mahoney, Veeco Instruments Inc., USA

Micrea Chipara, Univ. of Texas-Pan American, USA

David Duday, CRP - Gabriel Lippmann, Luxembourg

Filipe Vaz, Minho University, Portugal

Ju-Liang (John) He, Feng Chia University, Taiwan

Philippe Steyer, INSA Lyon, France

Paul Mayrhofer, Montanuniversität Leoben, Austria

Samir Aouadi, Southern Illinois University, USA

L. Martinu, Ecole Polytechnique,  Montreal, Canada

J. C. Sanchez-Lopez, CSIC Universidad de Sevilla

John Moore, Colorado School of Mines, USA

James Krzanowski, University New Hampshire, USA 

C.  Optical Thin Films 

Douglas Smith, Plymouth Grating Lab., USA

George Dobrowolski, NRC, Ottawa, Canada

Markus Wohlgenannt, University of Iowa, USA

Kentaro Utsumi, Tosoh Corporation, Japan

Gilles Dennier, Konarka, Austria

Mathias Schubert, University Nebraska-Lincoln, USA

Detlev Ristau, Laserzentrum Hannover, Germany

D. Carbon & Nitride Materials

Jian Ye, Forschungszentrum Karlsruhe, Germany

John E. Northrup, Palo Alto Research Center, USA

Eiji Osawa, Shinshu University, Japan

Jeffrey Glass, Duke University, USA

Georg Taeger, University Essen, Germany

Andrea C. Ferrari, University of Cambridge, UK

Thien-Phap Nguyen, University of Nantes, France

Michel W. Barsoum, Drexel University, USA

E.  Tribology and Mechanical Behavior of Coatings

         and Thin Films 

Marta Brizuela, INASMET, Spain

Frank E. Talke, UC San Diego, USA

Wilfred T. Tysoe, Univ. of Wisconsin-Milwaukee, USA

Dave Bahr, Washington State University, USA

Kenneth Holmberg, VTT, Finland

Ralph Spolenak, ETH Zürich, Switzerland

Rick Vinci, Lehigh University, USA

Koshi Adachi, Tohoku University, Sendai, Japan

Jeff Th. M. De Hosson, Univ. Groningen, Netherland

German Fox-Rabinovich, McMaster Univ., Canada

Bharat Bhushan, The Ohio State University, USA

Prasad Somuri, Sandia National Labs, USA

F. Characterization: linking synthesis, properties
 and microstructure 

David Larson, Imago Instruments, Madison WI, USA

André Vantomme, Katholieke Univ. Leuven, Belgium

Thomas Michely, Universität zu Köln, Germany

Joe Michael, Sandia National Labs, Albuquerque, USA

Wayne Kaplan, Technion, Haifa, Israel

G. Applications, Manufacturing and Equipment 

H. Klostermann, FEP, Fraunhofer Institute, Germany

Ali Erdemir, Argonne National Lab., USA

C. Buske, Plasmatreat GmbH, Steinhagen, Germany

H. Kodama, Kanagawa Acad. Sci. Technol., Japan

J. Alan Rees, Hiden Analytical Ltd., Warrington, UK

Hans Bernhoff, Uppsala University, Sweden

Venkat Selvamanickam, SuperPower Inc., USA

Ted Roberts, University of Manchester, UK

Toni Leyendecker, CemeCon, Würselen, Germany

Henk van den Berg, Kennametal, Germany

H. New Horizons in Coatings and Thin Films 

Grace Jia Lu , USC,  Los Angeles, USA

Chongwu Zhou, USC, Los Angeles, USA

Michael Brett, University of Alberta, Canada

Kostas Sarakinos, RWTH Aachen University, Germany

Pranesh Aswath, University of Texas, Arlington

M. T. Mathew, Rush Univ. Med. Center, Chicago, USA

Lawrence Kazmerski, NREL, Golden CO, USA

Yang Yang, UCLA, Los Angeles, USA

Topical Symposia TS1 – TS4  

C. Ciobanu, Colorado School Mines, Golden CO, USA

Eric Chason, Brown University, Providence RI, USA

Marcel Rost, University of Leiden, Netherlands

Aram Amassian, Cornell University, Ithaca NY, USA

M. Wertheimer, Ecole Polytechnique, Montreal, Canada