SHORT COURSE #1
Advanced Thin Film Characterization

Saturday, April 26, 2008, 8:30 am – 4:30 pm

Instructors:
Ivan Petrov, University of Illinois
Gary E. McGuire, International Technology Center

Course Objectives

• Learn about the wide range of analysis techniques available

• Understand the basic principles of the analysis techniques

• Learn about sample selection, handling, and preparation

• Develop insight into the interpretation of the data

• Learn about examples illustrating the strengths of key techniques

Technology Focus: 
The course will be focus on the analysis and characterization of thin films and coatings which may range in thickness from a few nanometers to several microns. Surface, interface and bulk composition as well as phase and microstructure may play a significant role in the properties of the material. The deposition technique and conditions may influence the composition and microstructure. Post-deposition treatment will influence the physical and chemical properties of the material. The applications of the films and coating may range over a broad spectrum and may include oxides, carbides, nitrides and etc.

Course Content: 

Surface and Interface Analysis
The use of surface and thin film analysis techniques such as AES, XPS, SIMS and RBS used in the characterization of films and coatings will be reviewed. 

Methods of determining surface and interface composition and elemental distributions will be presented.  A comparative evaluation of these analytical techniques in terms of sensitivity, depth resolution, chemical state identification, and spatial resolution will be discussed. The use of proximal probes such as AFM and STM to determine surface and film roughness and morphology will be highlighted. 

Microstructure and Defect Analysis
The characterization of crystallographic defects and microstructure of surfaces, interfaces, and bulk material using scanning electron (SEM) and transmission electron microscopy (TEM), electron diffraction, and X-ray diffraction will be presented. Bulk composition analysis using energy dispersive, wavelength dispersive spectroscopy, electron energy loss spectroscopy (EDS, WDS, EELS) will be reviewed. 

The principles of these techniques will be reviewed and their application in thin film analysis will be illustrated with examples which relate to the materials and deposition process. The relative merits (strengths and weaknesses) of these techniques will be described along with guidelines for their use for specific applications. The data from the characterization techniques will be correlated with other physical data.  

Who Should Attend
This course is intended for individuals who wish to expand their knowledge in the analysis techniques and their use in the characterization of thin film and coating materials. New engineers moving into this field from other areas, specialists wanting a broad overview, and managers wanting to gain a better understanding will find this course material useful. 

Instructors Biographical Sketch

Ivan Petrov is a Principal Research Scientist at the Frederick Seitz Materials Research Laboratory, an Adjunct Professor of Materials Science, and Director of the Center for Microanalysis of Materials at the University of Illinois. Ivan earned his Ph.D. in Physics from the Bulgarian Academy of Sciences; he was a Visiting Professor at Linköping University, Sweden, in 1986-1988 and 1997, and since 2000 holds an honorary Visiting Professorship of Surface Engineering at Sheffield Hallam University, U.K. His research interests are in the area of structural and chemical microanalyses, thin film physics, epitaxial growth, and surface science. He has published 190+ refereed papers and presented more than 50 invited and plenary lectures. In 2001, he was recognized as an AVS Fellow for “seminal contributions in determining the role of low-energy ion/surface interactions for controlling microstructure evolution during low temperature growth of transition metal nitride layers.” He received the DOE award for Sustained Outstanding Research in 1996 and received the Bunshah Prize for best paper at the International Conference on Metallurgical Coatings and Thin Films (ICMCTF) in 1994, 1997, and 2002. Ivan is currently on the AVS Board of Directors, a member of the Editorial Board of the Elsevier journal Vacuum an editor of  Surface and Coatings Technology, and an Associate Editor of AVS’ Surface Science Spectra. 

Gary E. McGuire is President of the International Technology Center, a non-profit research center located in Research Triangle Park, NC. He was formerly Director of Electronic Materials and Device Technology at MCNC. His responsibilities include the development and characterization of new materials and processes for novel semiconductor devices. He has done extensive research utilizing surface characterization techniques to investigate thin films and metallization schemes used in the microelectronics industry. He is Editor of the Journal of Vacuum Science and Technology B, Series Editor for William-Andrews Publications, Materials Science and Process Technology series. He has served the AVS as the Electronic Materials and Processing Division Chair, and has been on the Board of Directors, the Board of Trustees, and the Long Range Planning Committee and served as President in 1997. 

Course Materials: Course Notes 

Cost: (Lunch is not included in the course fee)
$400.00
$100.00 (Student w/valid ID) 

SHORT COURSE #2
 Nucleation and Growth of Nanostructures
(Materials science of small things: Self-assembly and self-organization)

 Saturday, April 26, 2008, 8:30 am – 4:30 pm

Instructor:
Joe Greene, University of Illinois

Course Objectives

• Understand the primary experimental variables and surface reaction paths controlling nucleation/growth kinetics and microstructural evolution during vapor-phase deposition.

• Learn about the primary classical and quantum effects which controllably alter the properties of increasingly small nanostructures.

• Understand the mechanisms controlling self-assembly and self-organization during nanostructure growth.

• Learn how to better design nanostructure growth processes.

Course Description

The study of nanotechnology is pervasive across widespread areas including microelectronics, optics, magnetics, hard and corrosion resistant coatings, mechanics, etc. Progress in each of these fields depends upon the ability to selectively and controllably deposit nanoscale structures with specified physical properties. This, in turn, requires control -- often at the atomic level -- of nanostructure, nanochemistry, and cluster nano-organization.

Deceasing size scales of solid clusters can result in dramatic property changes due to both "classical" effects associated with changes in average bond coordination and, as cluster sizes become of the order of the spatial extent of electron wavefunctions, quantum mechanical effects. The course will start with examples including reduced melting points, higher vapor pressures, increased optical bandgaps, decreased magnetic hysteresis, and enhanced mechanical hardness. Essential fundamental aspects, as well as the technology, of nanostructure formation and growth from the vapor phase will be discussed and highlighted with "real" examples using insights obtained from both in-situ and post-deposition analyses.

Nanostructure case studies include:

• examples of template, size, and coarsening effects: self-assembled Si/Si(001), Cu/Cu(001),TiN/TiN(001), TiN/TiN(111) nano-clusters,

• examples of controlled template plus strain effects: self-organized Ge wires on Si(111), Ge wires on Si(187 72 81), Au chains on Si(553), InAs metal wires on GaAs(001), insulated metal wires on Si(111),

• quantum dot engineering: formation, shape transformations, and ordering in self-organized SiGe/Si(001); InAs/GaAs(001), CdSe/ZnSe(001), PbSe/PbEuSe(111), Ag/Pt(111), and MnN/Cu(001) quantum dots, nano-catalysis: Au/TiO₂, and examples of 3D nanostructures: (Ti,Ce)N/SiO₂, TiB_x/SiO₂, and d-TaN/g-Ta₂N/SiO₂.

Course Content
 

The course provides an understanding of:

• the classical and quantum effects controlling the dramatic property changes observed in nanostructures as a function of cluster size and dimension (3D à 2D à 1D)

• self-assembly and self-organization during film growth

• nucleation and growth modes

• the role of the substrate template and defect structures in mediating growth kinetics

• the development, and control, of film stress (strain engineering)

• the use of film stress to controllably manipulate nanostructure

• other mechanisms (including surface segregation, surfactant effects, low-energy ion bombardment, cluster coarsening, etc) for controlling nanostructures

• the design of nanostructures with specified properties.

Who Should Attend?

Scientists and engineers involved in deposition, characterization, or manufacturing/marketing of nanostructures and nanostructure deposition equipment.

Instructor:

Joe Greene, Editor-in-Chief of Thin Solid Films, the D. B. Willett Professor of Materials Science and Physics, University of Illinois, and Past Director of the Frederick Seitz Materials Research Laboratory.

Course Materials:

Course notes with extensive reference lists provided.

Cost: (Lunch is not included in the course fee)   
$400.00
$100.00 (Student w/valid ID) 

Instructor Biographical Sketch

Joseph E. Greene is the D.B. Willett Professor of Materials Science and Physics at the University of Illinois. The focus of his research has been the development of an atomic-level understanding of adatom/surface interactions during vapor-phase film growth in order to controllably manipulate microchemistry, microstructure, and physical properties. His work has involved film growth by all forms of sputter deposition (MBE, CVD, MOCVD, and ALE). He was President of the American Vacuum Society in 1989, a consultant for many research and development laboratories, and a visiting professor at several universities. Recent awards include receipt of the Aristotle Award from SRC (1998), the Adler Award from the American Physical Society (1998), Fellow of the American Vacuum Society (1993) and the American Physical Society (1998), and the Turnbull Prize from the Materials Research Society (1999). He was elected to the US National Academy of Engineering in 2003.