Call Announcement
Adobe PDF Format

ALD 2005
Conference Overview 
Call for Papers
Invited Speakers
Committee Members
Contacts

Abstract Submission Guidelines
Abstract Deadline: May 13, 2005

Hotel and Travel Information
Hotel Deadline: July 15, 2005

Program Schedule
(Adobe PDF Format)

Presenter Instructions

Poster Instructions

Registration

Exhibitor Registration & Sponsor Form
(PDF Format)

Past Proceedings
(CD-ROM Format)

LOCATION CHANGES:

Sunday:
Welcome Reception and Registration:     Crowne Plaza

Monday-Wednesday:
Sessions and Registration:                     San Jose Convention Center Room J      

Exhibits and Posters:                             Crowne Plaza

The AVS Topical Conference on Atomic Layer Deposition (ALD 2005) will be a three-day meeting, dedicated to the science and technology of atomic layer controlled deposition of thin films. This conference is sponsored by the AVS Thin Film Division.

The conference follows the successful conferences: 

• ALD 2001, Monterey, CA

• ALD 2002, Seoul, South Korea

• ALD 2003, San Jose, CA

• ALD 2004, Helsinki, Finland

Atomic layer deposition (ALD) is used to fabricate ultrathin and conformal thin film structures for many semiconductor and thin film device applications. A unique attribute of ALD is that it uses sequential self-limiting surface reactions to achieve control of film growth in the monolayer or sub-monolayer thickness regime.  ALD is receiving attention for its potential applications in advanced high dielectric constant (high-k) gate oxides, storage capacitor dielectrics and copper diffusion barriers in advanced electronic devices.   It is also of interest in any advanced application that benefits from control of film structure in the nanometer or sub-nanometer scale. 

As in past conferences, the presentations will follow an all-electronic format, and electronic copies of the presentations (including oral component, and questions and answers) will be made available in the form of copy-secured CD-ROM's. 

Electronic Organization

We plan to organize the ALD 2005 presentations using ALL-ELECTRONIC means. Each of the presenters will be asked to prepare their presentation using PowerPoint. At the sessions, the presentations will be given using a computer projection display rather than overheads. An audio record will be made of each presentation, including questions and answers. Following the workshop, CD-ROMs will be distributed to the participants including each of the presentations (graphics, audio, and questions). Previous year CD-ROMS are for sale. To purchase click the Past Proceedings button on the left.

Sponsors:

 Exhibitors:

Invited Speakers

Theory
►Charles Musgrave, Stanford Univ, USA. -- "Quantum Chemical Studies of Surface Reactions in ALD"
►Riikka Puurunen,  VTT IT, Finland -- "Models for Surface Morphology in ALD"

Surface Studies
►Yves Chabal, Rutgers Univ., USA -- "FTIR of ALD Intermediates on Surfaces"

Dielectrics
►Hyeongtag Jeon, Hanyang Univ., Korea -- "Remote Plasma ALD of Hf-Oxide"
►Shi Woo Rhee,  Pohang Univ., Korea -- "Precursor Synthesis and ALD Process for High k Dielectric Materials for CMOS"
►Steven Marcus, ASM, USA -- "Plasma-Enhanced ALD of Dielectrics and Metals"
►Dennis Hausmann, Novellus, USA -- "Rapid Silica Deposition; Mechanism and Applications"

Metals
►Mikko Ritala,  Univ.of  Helsinki, Finland  -- "ALD of Metals"
►Roy Gordon,  Harvard Univ., USA -- "Precursor Synthesis and ALD of Metals"
►Naofumi Ohashi, SELETE, Japan, -- "ALD of TaN Barriers"

Semiconductor Applications
►Sang Bom Kang, Samsung, Korea -- " Applications and Challenges of ALD for Semiconductor Processing"
►Pravin Narwankar,  Applied Materials, USA -- "High-k Gate Stacks"
►Seshadri Ganguli,  Applied Materials, USA -- "ALD for Interconnect Technology"
►Frank Greer, Novellus, USA -- "ALD for Interconnect Technology"

Non-Semiconductor Applications
►Chris Summers, Georgia Tech, USA -- "ALD: A New Tool for Photonic Crystal Fabrication"

ALD 2005 International Committee

• Chair: Roy Gordon, Harvard University
• Past Chair: Mikko Ritala, University of Helsinki, Finland

ALD 2005 Organizing Committee

Contacts

AVS West
110 Yellowstone Drive, Suite 120
Chico CA 95973

Phone: 530-896-0477
Fax: 530-896-0487
E-mail: della@avs.org or ALD2005@avs.org