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Materials Modeling and Simulation

Technical Symposia: A | B | C | D | E | F | G | H
Topical Symposia: TS1 | TS2 | TS3 | TS4 | TS5

Symposium Chairs

Thomas Mussenbrock, BTU Cottbus, Germany,
David Holec, Montanuniversität Leoben, Austria,

Modeling and simulation of materials and related fabrication processes enable fundamental understanding as well as the prediction of behavior and properties of materials. By exploiting the power of modern computer systems, scale-bridging modeling and simulation approaches are realized. However, even the best simulation methods and tools are still limited with respect to their validity and accuracy. This is in fact known by the developers but often not appreciated by the users (both theorists and experimentalists) of the simulation tools. This topical symposium on "Materials Modeling and Simulation" is intended to provide a broad overview of the conceptually different and mutually complementing modeling and simulation approaches in materials sciences and their validity and limitations. The goal is to generate an idea of what is possible and what is not, demonstrated on practical examples from plasma physics, to thin film deposition to materials properties and performance.

Invited Speakers  

Ralf Drautz, ICAMS, Ruhr University Bochum, Germany
“From Density Functional Theory to High-temperature Materials”

Mark J. Kushner, University of Michigan, USA
“From Plasmas Toward Surfaces: How Plasma Simulation Supports Materials Science”




Sponsored by:
AVS Advanced
Surface Engineering