Overview

The 2019 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) will be held at the Monterey Marriott in Monterey, CA, April 2-4, 2019.

The FCMN will bring together scientists and engineers interested in all aspects of the characterization technology needed for nanoelectronic materials and device research, development, and manufacturing. All approaches are welcome: chemical, physical, electrical, magnetic, optical, in-situ, and real-time control and monitoring. The conference will summarize major issues and provided critical reviews of important semiconductor techniques needed as the semiconductor industry moves to silicon nanoelectronics and beyond.

The conference consists of formal invited presentation sessions and poster sessions for contributed papers. The poster papers cover new developments in characterization and metrology especially at the nanoscale. The conference series began 1995 and is the 12th conference in the series.

2019 FCMN Brochure (PDF)
Sponsorship and Exhibitor Form (PDF)
Past Conferences Publications/Talks

Testimonials

"There were a total of 34 talks and 81 poster presentations that summarized major issues and provided critical reviews of crucial semiconductor developments and techniques needed as the industry evolves to silicon nanoelectronics and beyond."
-Alex Braun, "A Jaunt Through Nanotechnopolis," Semiconductor International.

"If you want to meet, greet, and learn from the world's experts in metrology, this is the place to be."
-Dan Hutcheson, The Chip Insider.

Program Committee and Chairs

Technical Contact:
David Seiler
E-mail: david.seiler@nist.gov

Publication Contact:
Erik Secula
E-mail: erik.secula@nist.gov

Program Co-Chairs:

David Seiler, NIST
Alain Diebold, CNSE, SUNY Polytechnic Institute
Zhiyong Ma, Intel
Paul van der Heide, IMEC

Program Committee:

Overview

Testimonials

Program Committee and Chairs

Conference Information and Office