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The 10th international conference on atomic layer
deposition
(ald 2010) will be held June 20-23, 2010 in seoul,
korea.
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Scope
- 2009 Conference
The AVS Topical Conference on Atomic Layer Deposition (ALD 2009) will be a three-day meeting (preceded by one day of tutorials), dedicated to the science and technology of atomic layer controlled deposition of thin films. Atomic layer deposition (ALD) is used to fabricate ultrathin and conformal thin film structures for many semiconductor and thin film device applications. A unique attribute of ALD is that it uses sequential self-limiting surface reactions to achieve control of film growth in the monolayer or sub-monolayer thickness regime. ALD is receiving attention for its potential applications in advanced high dielectric constant (high-k) gate oxides, storage capacitor dielectrics and copper diffusion barriers in advanced electronic devices, as well as for solar energy and biological applications. It is of interest for any advanced technologies that require control of film structure in the nanometer or sub-nanometer scale. As in past conferences, the presentations will follow an all-electronic format, and electronic copies of the presentations (including oral component, and questions and answers) will be made available in the form of copy-secured DVDs.
 Download Sponsor/Exhibit Form  (102k pdf)
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Topics
The conference will cover a wide range of topics including
- ALD Precursors and Precursor Design
- Simulation, Modeling, and Theory of ALD
- Reaction Mechanisms for Atomic Layer Growth
- In-situ Monitoring and Analysis
- ALD Surface Chemistry and Initiation of ALD Growth
- Surface Preparation for ALD
- Characterization of ALD Coatings
- Initiation of ALD Growth
- Radical and Other Energy-Enhanced ALD Methods
- Molecular Layer Deposition
- ALD of Oraganic-Inorganic Hybrid Materials
- Atomic Layer Epitaxy and Doping
- Patterned and Selective Area ALD
- Equipment and Manufacturing
- Precursor Delivery Systems
- Applications of ALD in Microelectronics
- Applications of ALD in Nanotechnology
- ALD for MEMS and NEMS
- ALD for Catalytic, Photovoltaic, Optical, and Novel Energy Applications
- ALD of Optical and Magnetic Materials
- Nano-laminate or Multi-component Materials
- Highly Conformal ALD Processes
- Reliability of ALD Materials
- Novel Applications of ALD
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Invited Speakers
- Rino Choi, Inha University
- Christophe De Tavernier, University of Gent
- Thomas Riedl, Technical University of Braunschweig
- Greg Parsons, North Carolina State University
- Erwin Kessels, Eindhoven University
- Markku Leskela, University of Helsinki
- David Levy, Eastman Kodak Company
- Zia Karim, AIXTRON
- Sven Van Elshocht, IMEC
- Gary Rubloff, University of Maryland
- Riikka Purrunen, VTT Technical Research Centre of Finland
- Rino Choi, Inha University
- Wilman Tsai, Intel
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Conference Chairs
Jeffrey Elam
Argonne National Laboratory
jelam@anl.gov
Technical Program Committee
- Marek Boleslawski, SAFC Hitech
- Kisik Choi, AMD
- Annelies Delabie, IMEC - Chair ALD 2008
- Steve George, University of Colorado - Chair ALD 2001
- Roy Gordon, Harvard University - Chair ALD 2005
- Suvi Haukka, ASM
- Chris Hodson, Oxford Instruments
- Cheol-Seong Hwang, Seoul National University
- Hyung-Jun Kim, Postech University - Chair ALD 2006
- Mato Knez, Max-Planck-Institute
- Paul Ma, Applied Materials
- Mikko Ritala, University of Helsinki - Chair ALD 2004
- Uwe Schroeder, Qimonda
- Yoshi Senzaki, AIXTRON
- Peter Ye, Purdue University
ALD 2009 International Advisory Committee
- Yves Chabal, University of Texas at Dallas - Chair ALD 2007
- Peter Heys, SAFC Hitech
- Hyeongtag Jeon, Hanyang University - Chair ALD 2002
- Erwin Kessels, Eindhoven University of Technology - Chair ALD 2008
- Victor Ku, TSMC
- Sang-In Lee, SYNOS Technology
- Markku Leskela, University of Helsinki
- Brendan McDougall, Applied Materials
- Dae-Gyu Park, IBM
- Greg Parsons, North Carolina State University - Chair ALD 2003
- Riikka Puurunen, VTT
- Shi-woo Rhee, Postech University - Chair ALD 2006
- Sasangan Ramanathan, AIXTRON
- Steve Rossnagel, IBM
- Tom Seidel, Seitek50
- Glen Wilk, ASM - Chair ALD 2007
- Tetsuji Yasuda, AIST
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Contact
AVS
Della Miller
110 Yellowstone Dr., Suite 120
Chico CA 95973
Phone: 530-896-0477
Fax: 530-896-0487
E-mail: della@avs.org
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