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AVS Information

ALE 2015 Workshop Overview
Extending Moore's law beyond the 10nm node will increasingly rely on high precision processes employing new materials with high-quality surfaces. Atomic layer etching & atomic layer clean technology is a promising pathway to achieve these fundamental requirements.

In conjunction with ALD 2015 (at the Portland Hilton), the AVS Plasma Science and Technology Division will be hosting a workshop on Atomic Layer Etching.The goals of the meeting are to provide research focus, report progress to-date and foster collaboration to accelerate this unique capability. Latest findings are expected from experts at major universities, semiconductor manufacturers and leading equipment suppliers.

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http://www2.avs.org/conferences/ALD/2015/generic/arrow_red.gif ALE 2015 Workshop Schedule
http://www2.avs.org/conferences/ALD/2015/generic/arrow_red.gif ALD 2015 Workshop Registration

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Invited Speakers

  • Eric Hudson, Lam Research - “Fluorocarbon based Atomic Layer Etching of SiO2”
     

  • W.M.M. Kessels, Eindhoven Univ. of Technology - “Atomic Layer Etching: what can we learn from ALD?”
     

  • Peter Ventzek, Tokyo Electron America Inc - “Modeling and simulation for rapid advanced cyclic etch processes”
     

  • S. Samukawa, Tohoku University – “A Neutral Beam Etching for Control of Atomic Layer Defect Generation and Chemical Reaction”
     

  • Bob Turkot, Intel, "The Need for ALE”
     

  • Geun Young Yeom, Sungkyunkwan University - “Atomic Layer Etching of 2D Materials”

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Presentation Guidelines
Like ALD 2015, the ALE 2015 Workshop presentations will follow an all-electronic recorded format, and electronic copies of the presentations (including oral component, and questions and answers) will be made available in the form of copy-secured DVDs.

ALE 2015 Workshop Oral Presentation Guidelines (PDF)
ALE 2015 Workshop Poster Presentation Guidelines (PDF)
ALE 2015 Workshop Copyright Transfer Form (PDF)


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Manuscript Deadline: August 30, 2015

Journal of Vacuum Science & Technology A is soliciting research articles for publication in a Special January/February 2016 Issue on Atomic Layer Etching

This special issue is planned in collaboration with the ALE 2015 Workshop to be held in Portland, Oregon during July 1-2, 2015. The Special Issue will be dedicated to the science and technology of atomic layer controlled etching of thin films. While a significant fraction of the articles are expected to be based on material presented at ALE 2015 Workshop, research articles that are on ALE but were not presented at this conference are also welcome: the special issue will be open to all articles on the science and technology of ALE.

Authors are encouraged to submit their work to the AVS Journal of Vacuum Science & Technology A  (JVST A). Papers will be reviewed according to criteria set by the JVST and must meet JVST standards for both technical content and written English. All manuscripts are refereed to the same standards as regular JVST submissions.

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http://www2.avs.org/conferences/IVNC/images_generic/arrow_red.gif Submit Online
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Online Instructions

Manuscript Guidelines
In preparing your article, you should follow the 
online instructions for contributors. Authors are encouraged to use the JVST templates. It is very IMPORTANT that authors indicate to which conference the paper is submitted. Online, you will have an opportunity to tell us that your paper is a part of the special issue by choosing “ALE Special Issue.”

Acceptable manuscript file types are MSWord, LaTeX, and PDF. For the initial submission/review process, a single PDF or MSWord file including the figures is sufficient, however submitting the separate article file (including any tables and a page listing the figure captions) and also the individual figure files is preferred.  The separate files are required further in the process so initial submission with these is recommended. 

Use of color in Figures is encouraged. Your FIGURES CAN APPEAR ONLINE IN COLOR FOR FREE. Prepare illustrations in the final published size, not oversized or undersized.


The ALE 2015 Workshop offers excellent sponsorship opportunities that will enable an organization to maximize the impression they make at the conference given their budget constraints. Please review our Sponsorship/Exhibit form for more information. Download Sponsor/Exhibit Form

WORKSHOP REGISTRATION: Registration includes welcome reception (July 1), breaks/lunches, poster session refreshments and one (1) DVD Proceedings (Conference Dates: July 1-2). Online Registration  Coming April 2015

Conference Hotel
Portland Hilton (Website)
921 SW Sixth Ave.
Portland,
OR, 97204

Special rates have been reserved for ALE 2015 Workshop participants as part of the ALD 2015 block at the Portland Hilton--the room rates include complimentary high speed internet access in the guest rooms. The hotel deadline is
June 1, 2015.
Note: due to limited space we recommend booking as early as possible--room availability is not guaranteed through this date; only the rates are guaranteed.
 View Hotel Rates and Travel Details

Online Reservations  Click Here

Chair: Eric A. Joseph, IBM TJ Watson Research Center

  • Ankur Agarwal, Applied Materials

  • Satoshi Hamaguchi, Osaka University

  • Craig Huffman, SEMATECH

  • Keren Kanarik, Lam Research

  • Alok Ranjan , TEL

  • Iqbal R. Saraf, IBM Systems & Technology Group, Hopewell Junction, NY

  • Satyarth Suri, Intel

  • Steven Vitale, MIT Lincoln Laboratory

 

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General Sponsors:

Sponsor/Exhibit Form