|
*Hover mouse over buttons as some buttons display additional links |
|
Abstract Deadline |
|
Mail/Fax: May 9,
2007 |
|
E-mail/Web: May 17,
2007 |
|
|
*On front cover: AVS Art Zone Winners: 1st Place-"Water
Droplet" - courtesy of Tom Krupenkin, Bell Labs,
Alcatel-Lucent 2006 (top right), and 2nd Place- "Look to
the Future" - courtesy of Charles Clifford/Felicia
Green, NPL. Crown 2006 (top left) |
ASSD Special Flyer
Click here for more Details
_small.jpg)
MEMS Special Flyer
Click here for more Details
MIND Special Flyer
Click here for more Details
SSD Special Flyer
Click here for more Details
TFD Special Flyer
Click here for more Details
VTD Special Flyer
Click here for more Details |
The
AVS encourages you to participate in, and submit an abstract to, the
AVS 54th International Symposium in
Seattle,
WA, USA.
If you have ever been to an AVS Symposium, or if this Call for
Abstracts is your first encounter with the AVS, you will note that a
couple of themes permeate the Symposium.
A central and defining theme of the AVS program is
surfaces/interfaces. Much of the technical program deals with the
state-of-the-art science and technology of measurement, manipulation
and processing/deposition of material interfaces and surfaces. The
program covers the gamut of fundamental concepts and properties of
surfaces/interfaces to methods and processes in manufacturing and
devices. It covers biological materials to solid state electronics;
it covers friction and wear in ambient conditions to plasma
deposition of thin films in a vacuum environment. If your work
involves materials, interfaces, and processing, the AVS is the venue
where you should be presenting your work!
As you peruse the Call for Papers, you will notice the second
prevailing theme of the symposium is Nano Science and Technology. As
one moves to nanoscale materials and processes, surface and
interface properties play a dominant role. Consequently, it is no
surprise that more than three quarters of the program encompasses
various aspects of Nano Science and Technology. Nor is it a surprise
that the AVS Program is (and has been for Two decades) one of the
premier venues for Nano programming. If you work in Nano, then there
is no doubt that the AVS is where you should be presenting your
work!
The foundation of the AVS is vacuum science and technology, which
over the years has evolved into use of controlled environments for
quantitative measurements and processing of materials interfaces.
While there are many direct links to vacuum science and technology
in many of the program topics, controlled environments and
measurements are now being applied to a spectrum of in vacuo, in
situ, in operando, and in vivo systems. If your work involves
development of controlled environments and processing of interfacial
systems or quantitative interfacial analysis – from vacuum, to
plasmas, to biological systems, then the AVS is the venue where you
need to present your work!
This year’s symposium has some special programming in addition to
the core AVS technical program.
Five
topical conferences (In-situ Electron Microscopy,
Marine Biofouling, Nano-Manufacturing, Neutron Scattering, and
Plasmonics) and two featured topics (Tribology and the BioInterfaces
Plenary session on Global Health Technologies) will run concurrent
with the Symposium. We are also pleased to tell you that the
American Institute of Physics’ Industrial Physics Forum (IPF) will
be co-located with the AVS Symposium as well. The theme of this
year’s IPF is “The Energy Challenge.” The program will augment
sessions on energy in the core program and in the topical
conference. Given the importance of energy – its generation,
harvesting, storage and use – to our daily lives, this will be a
must attend event.
As you examine the Call for Papers, we’re sure you will agree that
you need to participate in this Symposium.
We look forward to your contribution and seeing
you in Seattle!
John Russell - AVS-54 Program Chair
Tom Beebe - AVS-54 Program Co-Vice Chair
Bridget Rogers –
AVS-54 Program Co-Vice Chair
|
